DocumentCode :
1542322
Title :
Characterization of NbN/AlN/NbN tunnel junctions
Author :
Zhen Wang ; Terai, H. ; Kawakami, A. ; Uzawa, Y.
Author_Institution :
Commun. Res. Lab., Minist. of Posts & Telecommun., Kobe, Japan
Volume :
9
Issue :
2
fYear :
1999
fDate :
6/1/1999 12:00:00 AM
Firstpage :
3259
Lastpage :
3262
Abstract :
We report on tunneling properties and interface structures for high-quality NbN/AlN/NbN tunnel junctions fabricated on ambient temperature MgO substrates. Junction quality and electrical parameters were systematically investigated in a very wide range for current density. The junctions show a very good junction quality with a high gap voltage, large I/sub c/R/sub N/ product, and large R/sub sg//R/sub N/ ratio as the current density varied from 100 A/cm/sup 2/ to above 100 kA/cm/sup 2/. The average barrier heights of the NbN/AlN/NbN tunnel junctions are calculated from the barrier thickness dependence of the critical current density. We found that the current density has two distinct types of dependency on the AlN barrier thickness, corresponding to two average barrier heights in different regions for the current density.
Keywords :
aluminium compounds; critical current density (superconductivity); niobium compounds; superconductive tunnelling; MgO substrate; NbN-AlN-NbN; NbN/AlN/NbN tunnel junction; barrier height; critical current density; electrical parameters; interface structure; tunneling properties; Current density; Current measurement; Electrodes; Josephson junctions; Sputtering; Substrates; Superconducting epitaxial layers; Temperature; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.783724
Filename :
783724
Link To Document :
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