Demonstration of a sidewall capacitor to evaluate dielectrics and metal barrier thin films

Author

Lin, Kevin L. ; Carver, Colin T. ; Chebiam, Ramanan ; Clarke, Joseph ; Faber, Jean ; Harmes, Michael ; Indukuri, Tejaswi ; Jezewski, Christopher ; Kobrinsky, Mauro ; Krist, Brian ; Lakamraju, Narendra ; Lang, Helmut ; Myers, Alan M. ; Plombon, John J. ; S

Author_Institution

Components Res., Intel Corp., Hillsboro, OR, USA

fYear

2014

fDate

20-23 May 2014

Firstpage

177

Lastpage

180

Abstract

A sidewall planar capacitor (SW CAP) vehicle is developed to closely simulate processing conditions for metal barrier and dielectric in an integrated structure. For a known tantalum barrier for copper on a low-K dielectric, SW CAP TDDB is similar to those measured on an integrated vehicle. SW CAP results are useful for comparing electrical reliability of different dielectric systems, and effective in determining physical continuity of copper metal barriers.

Keywords

capacitors; copper; dielectric materials; dielectric thin films; tantalum; Cu; TDDB; Ta; dielectric systems; dielectrics; electrical reliability; integrated structure; low-K dielectric; metal barrier thin films; sidewall planar capacitor vehicle; Capacitors; Dielectric measurement; Fabrication; Materials; Metals; Vehicles;

fLanguage

English

Publisher

ieee

Conference_Titel

Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International

Conference_Location

San Jose, CA

Print_ISBN

978-1-4799-5016-4

Type

conf

DOI

10.1109/IITC.2014.6831864

Filename

6831864