Systematic investigation of ramp edge junction using Ca-doped and Ga-doped PBCO barrier

Author

Horibe, M. ; Hayashi, N. ; Kawai, K.-I. ; Maruyama, M. ; Fujimaki, A. ; Hayakawa, H.

Author_Institution

Dept. of Quantum Eng., Nagoya Univ., Japan

Volume

9

Issue

2

fYear

1999

fDate

6/1/1999 12:00:00 AM

Firstpage

3378

Lastpage

3381

Abstract

We have investigated systematically the characteristics of ramp edge junctions with Ca- and Ga-doped PBCO barriers. The localized state density g and/or the volume of the state v in the barriers are increased by Ca-doping and decreased by Ga-doping. Ca-doping reduces the I/sub c/R/sub n/ products, and Ga-doping enhances the I/sub c/R/sub n/ products, though the dominant transport mechanisms are direct tunneling for the junctions having I/sub c/R/sub n/ greater than 1 mV. The change in the I/sub c/R/sub n/ products can be interpreted in terms of the proximity effect at the interface states formed by hybridization between the localized states in the barrier and conduction electron states of electrodes. The ideal superconductor-insulator interface at the junction interfaces is required to enhance I/sub c/R/sub n/ products.

Keywords

Josephson effect; barium compounds; calcium; critical currents; gallium; high-temperature superconductors; interface states; localised states; praseodymium compounds; proximity effect (superconductivity); Ca doping; Ga doping; PBCO barrier; PrBaCuO:Ca; PrBaCuO:Ga; conduction electron states; critical current-normal resistance product; current transport; direct tunneling; hybridization; interface states; localized states; proximity effect; ramp edge Josephson junction; superconductor-insulator interface; Conducting materials; Conductivity; Electrodes; Fabrication; High temperature superconductors; Josephson junctions; Substrates; Superconducting epitaxial layers; Superconducting films; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.783754

Filename

783754