• DocumentCode
    1544465
  • Title

    History and future perspective of the modern silicon bipolar transistor

  • Author

    Ning, Tak H.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    48
  • Issue
    11
  • fYear
    2001
  • fDate
    11/1/2001 12:00:00 AM
  • Firstpage
    2485
  • Lastpage
    2491
  • Abstract
    A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors
  • Keywords
    bipolar transistors; history; semiconductor technology; technological forecasting; HBTs; IBM Research; Si; SiGe; bipolar transistors; historical account; scaling limits; Bipolar transistors; Circuits; Educational institutions; Gallium arsenide; Helium; Heterojunction bipolar transistors; History; MOSFETs; Silicon; Spine;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.960372
  • Filename
    960372