DocumentCode :
1544465
Title :
History and future perspective of the modern silicon bipolar transistor
Author :
Ning, Tak H.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
48
Issue :
11
fYear :
2001
fDate :
11/1/2001 12:00:00 AM
Firstpage :
2485
Lastpage :
2491
Abstract :
A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors
Keywords :
bipolar transistors; history; semiconductor technology; technological forecasting; HBTs; IBM Research; Si; SiGe; bipolar transistors; historical account; scaling limits; Bipolar transistors; Circuits; Educational institutions; Gallium arsenide; Helium; Heterojunction bipolar transistors; History; MOSFETs; Silicon; Spine;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.960372
Filename :
960372
Link To Document :
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