DocumentCode :
1545263
Title :
Effect of bottom electrode materials on the electrical and reliability characteristics of (Ba, Sr)TiO3 capacitors
Author :
Tsai, Ming Shiahn ; Sun, S.C. ; Tseng, Tseung-Yuen
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
46
Issue :
9
fYear :
1999
fDate :
9/1/1999 12:00:00 AM
Firstpage :
1829
Lastpage :
1838
Abstract :
The dielectric constant and the leakage current density of (Ba, Sr)TiO3 (BST) thin films deposited on various bottom electrode materials (Pt, Ir, IrO2/Ir, Ru, RuO2/Ru) before and after annealing in O2 ambient were investigated. The improvement of crystallinity of BST films deposited on various bottom electrodes was observed after the postannealing process. The dielectric constant and leakage current of the films mere also strongly dependent on the postannealing conditions. BST thin film deposited on Ir bottom electrode at 500°C, after 700°C annealing in O2 for 20 min, has the dielectric constant of 593, a loss tangent of 0.019 at 100 kHz, a leakage current density of 1.9×10 -8 A/cm2 at an electric field of 200 kV/cm with a delay time of 30 s, and a charge storage density of 53 fC/μm2 at an applied field of 100 kV/cm. The BST films deposited on Ir with post-annealing can obtain better dielectric properties than on other bottom electrodes in our experiments. And Ru electrode is unstable because the interdiffusion of Ru and Ti occurs at the interface between the BST and Ru after postannealing. The ten year lifetime of time-dependent dielectric breakdown (TDDB) studies indicate that BST on Pt, Ir, IrO2/Ir, Ru, and RuO2/Ru have long lifetimes over ten gears on operation at the voltage bias of 2 V
Keywords :
annealing; barium compounds; ceramic capacitors; dielectric thin films; iridium; iridium compounds; platinum; reliability; ruthenium; ruthenium compounds; strontium compounds; thin film capacitors; (Ba, Sr)TiO3 capacitors; 100 kHz; 2 V; 20 min; 30 s; 500 C; 700 C; BST films; BST thin film; BaSrTiO3-Ir; BaSrTiO3-IrO2-Ir; BaSrTiO3-Pt; BaSrTiO3-Ru; BaSrTiO3-RuO2-Ru; Ir; IrO2/Ir; O2; O2 ambient; Pt; Ru; Ru electrode; RuO2/Ru; annealing; bottom electrode materials; charge storage density; dielectric constant; leakage current; leakage current density; post-annealing; postannealing; postannealing c; reliability; time-dependent dielectric breakdown; Annealing; Binary search trees; Crystalline materials; Crystallization; Dielectric constant; Dielectric materials; Dielectric thin films; Electrodes; Leakage current; Sputtering;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.784181
Filename :
784181
Link To Document :
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