Simulation-Based Study of MEMS X-Ray Optics for Microanalysis

Author

Ezoe, Yuichiro ; Mitsuishi, Ikuyuki ; Takagi, Utako ; Ishizu, Kensuke ; Moriyama, Teppei ; Mitsuda, Kazuhisa

Author_Institution

Dept. of Phys., Tokyo Metropolitan Univ., Tokyo, Japan

Volume

46

Issue

9

fYear

2010

Firstpage

1295

Lastpage

1300

Abstract

A new type of X-ray optics system based on microelectromechanical systems technologies is proposed for microanalysis. Side walls of micro pores made by silicon dry etching or X-ray lithography are used as X-ray mirrors. Ray-tracing simulations are constructed to estimate the performance of a planar X-ray optics system made of silicon and nickel. From simulations, we conclude that, with this type of optics, a fine focus on the order of <; 10 μm is possible and the intensity gain is 1000-7000 at Al K_α 1490 eV, compared to the case without this optical system.

Keywords

X-ray optics; micro-optics; mirrors; MEMS x-ray optics; X-ray lithography; X-ray mirrors; microanalysis; micropores; ray-tracing simulations; silicon dry etching; Microelectromechanical systems; Micromechanical devices; Mirrors; Optical collimators; Optical reflection; Optical refraction; Optical variables control; Silicon; Stimulated emission; X-ray imaging; Micro analysis; X-ray; microelectromechanical systems (MEMS);

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/JQE.2010.2047380

Filename

5518525