DocumentCode :
1546208
Title :
Demonstration of submicron depletion-mode GaAs MOSFETs with negligible drain current drift and hysteresis
Author :
Wang, Yi Chun ; Hong, M. ; Kuo, J.M. ; Mannaerts, J.P. ; Kwo, J. ; Tsai, H.S. ; Krajewski, J.J. ; Chen, Y.K. ; Cho, A.Y.
Author_Institution :
Lucent Technol., AT&T Bell Labs., Murray Hill, NJ, USA
Volume :
20
Issue :
9
fYear :
1999
Firstpage :
457
Lastpage :
459
Abstract :
We successfully fabricated submicron depletion-mode GaAs MOSFETs with negligible hysteresis and drift in drain current using Ga2O3(Gd2O3) as the gate oxide. The 0.8-μm gate-length device shows a maximum drain current density of 450 mA/mm and a peak extrinsic transconductance of 130 mS/mm. A short-circuit current gain cutoff frequency (fT) of 17 GHz and a maximum oscillation frequency (fmax) of 60 GHz were obtained from the 0.8 μm×60 μm device. The absence of drain current drift and hysteresis along with excellent characteristics in the submicron devices is a significant advance toward the manufacture of commercially useful GaAs MOSFETs.
Keywords :
III-V semiconductors; MOSFET; gallium arsenide; oxidation; 0.8 micron; 17 GHz; 60 GHz; GaAs-Ga/sub 2/O/sub 3/:Gd/sub 2/O/sub 3/; current gain cutoff frequency; drain current drift; gate oxide; hysteresis; maximum oscillation frequency; submicron depletion-mode GaAs MOSFET; transconductance; Cutoff frequency; FET integrated circuits; Gallium arsenide; Hysteresis; MMICs; MOSFET circuits; Microwave FET integrated circuits; Microwave integrated circuits; Monolithic integrated circuits; Substrates;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.784451
Filename :
784451
Link To Document :
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