Title :
Fabrication of second-order gratings for 1.55 μm DFB lasers using deep UV lithography
Author :
Goarin, E. ; Louis, Y. ; Sainson, S.
Author_Institution :
Lab. de Marcoussis, CR-CGE, Marcoussis
fDate :
1/21/1988 12:00:00 AM
Abstract :
Second-order gratings for 1.55 μm DFB lasers have been fabricated on InP substrate using contact deep UV (220 nm) lithography. Localised gratings with a 0.48 μm pitch were clearly resolved in PMMA photoresist and then transferred in InP by wet chemical etching
Keywords :
diffraction gratings; distributed feedback lasers; integrated optics; laser transitions; optical workshop techniques; photolithography; semiconductor junction lasers; 0.48 micron; 1.55 micron; 220 nm; DFB lasers; InP substrate; PMMA photoresist; contact type; deep UV lithography; second-order gratings; semiconductor lasers; submicron pitch; wet chemical etching;
Journal_Title :
Electronics Letters
