DocumentCode :
1546972
Title :
Extreme ultraviolet lithography: will it be ready in time?
Author :
Hutcheson, G.D.
Author_Institution :
VLSI Research Inc.
Volume :
38
Issue :
11
fYear :
2001
Firstpage :
15
Lastpage :
16
Keywords :
Laser modes; Lithography; Manufacturing; Mirrors; Photonic integrated circuits; Silicon; Synchrotrons; Ultraviolet sources; Very large scale integration; X-ray lasers;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.2001.963237
Filename :
963237
Link To Document :
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