DocumentCode
1547215
Title
Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates
Author
Selvamanickam, V. ; Galinski, G. ; DeFrank, J. ; Trautwein, C. ; Haldar, Pradeep ; Balachandran, U. ; Lanagan, M. ; Chudzik, M.
Author_Institution
Intermagnetics Gen. Corp., NY, USA
Volume
9
Issue
2
fYear
1999
fDate
6/1/1999 12:00:00 AM
Firstpage
1523
Lastpage
1526
Abstract
YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.
Keywords
MOCVD coatings; barium compounds; critical current density (superconductivity); high-temperature superconductors; superconducting thin films; yttrium compounds; Y-Ba-Cu-O; Y-Ba-Cu-O film deposition; buffered metal substrates; critical current density; high temperature superconductor; ion beam assisted deposition; metal organic chemical vapor deposition; Buffer layers; Chemical vapor deposition; Critical current density; Ion beams; MOCVD; Nickel alloys; Organic chemicals; Substrates; Thermomechanical processes; Yttrium barium copper oxide;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/77.784683
Filename
784683
Link To Document