• DocumentCode
    1547215
  • Title

    Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates

  • Author

    Selvamanickam, V. ; Galinski, G. ; DeFrank, J. ; Trautwein, C. ; Haldar, Pradeep ; Balachandran, U. ; Lanagan, M. ; Chudzik, M.

  • Author_Institution
    Intermagnetics Gen. Corp., NY, USA
  • Volume
    9
  • Issue
    2
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    1523
  • Lastpage
    1526
  • Abstract
    YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.
  • Keywords
    MOCVD coatings; barium compounds; critical current density (superconductivity); high-temperature superconductors; superconducting thin films; yttrium compounds; Y-Ba-Cu-O; Y-Ba-Cu-O film deposition; buffered metal substrates; critical current density; high temperature superconductor; ion beam assisted deposition; metal organic chemical vapor deposition; Buffer layers; Chemical vapor deposition; Critical current density; Ion beams; MOCVD; Nickel alloys; Organic chemicals; Substrates; Thermomechanical processes; Yttrium barium copper oxide;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.784683
  • Filename
    784683