• DocumentCode
    1547232
  • Title

    A theoretical analysis of the laser melt-level monitoring system for the Czochralski crystal growing furnaces

  • Author

    Li, Zhixin ; Koziol, Jurek

  • Author_Institution
    Ferrofluidics Corp., Nashua, NH, USA
  • Volume
    46
  • Issue
    3
  • fYear
    1997
  • fDate
    6/1/1997 12:00:00 AM
  • Firstpage
    722
  • Lastpage
    730
  • Abstract
    This paper discusses the operating theory of a trigonometrical laser melt-level monitoring system as applied to Czochralski crystal pullers. The surface movement of the silicon melt is modeled with three-dimensional random harmonic waves. The effect of this motion on the spatial distribution of the laser signal is simulated and studied. Means of separating the laser signal from the noise caused by the background radiation from the melt is described. Statistical analysis is used to determine measurement accuracy. It has been found that with a relatively tranquil melt surface, characterized by a small wave amplitude to wavelength ratio and a large wavelength to laser beam size ratio, the laser signal is confined to a limited area, thus can be effectively acquired by a photo detector. The accurate measurement can then be achieved with statistical means. Experimental data generated with water and molten silicon surfaces are in good conformity with the theoretical results
  • Keywords
    crystal growth from melt; elemental semiconductors; error analysis; furnaces; harmonic analysis; level measurement; measurement by laser beam; random noise; silicon; statistical analysis; water; 3D random harmonic waves; Czochralski crystal growing furnaces; Czochralski crystal puller; Si; Si melt; background radiation; laser melt-level monitoring; laser signal; measurement accuracy; melt surface; molten surface; operating theory; photo detector; small wave amplitude; spatial distribution; statistical analysis; statistical means; surface movement; trigonometrical laser monitoring; water; Background noise; Laser modes; Laser noise; Laser theory; Monitoring; Silicon; Statistical analysis; Surface emitting lasers; Surface waves; Wavelength measurement;
  • fLanguage
    English
  • Journal_Title
    Instrumentation and Measurement, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9456
  • Type

    jour

  • DOI
    10.1109/19.585441
  • Filename
    585441