DocumentCode
1547232
Title
A theoretical analysis of the laser melt-level monitoring system for the Czochralski crystal growing furnaces
Author
Li, Zhixin ; Koziol, Jurek
Author_Institution
Ferrofluidics Corp., Nashua, NH, USA
Volume
46
Issue
3
fYear
1997
fDate
6/1/1997 12:00:00 AM
Firstpage
722
Lastpage
730
Abstract
This paper discusses the operating theory of a trigonometrical laser melt-level monitoring system as applied to Czochralski crystal pullers. The surface movement of the silicon melt is modeled with three-dimensional random harmonic waves. The effect of this motion on the spatial distribution of the laser signal is simulated and studied. Means of separating the laser signal from the noise caused by the background radiation from the melt is described. Statistical analysis is used to determine measurement accuracy. It has been found that with a relatively tranquil melt surface, characterized by a small wave amplitude to wavelength ratio and a large wavelength to laser beam size ratio, the laser signal is confined to a limited area, thus can be effectively acquired by a photo detector. The accurate measurement can then be achieved with statistical means. Experimental data generated with water and molten silicon surfaces are in good conformity with the theoretical results
Keywords
crystal growth from melt; elemental semiconductors; error analysis; furnaces; harmonic analysis; level measurement; measurement by laser beam; random noise; silicon; statistical analysis; water; 3D random harmonic waves; Czochralski crystal growing furnaces; Czochralski crystal puller; Si; Si melt; background radiation; laser melt-level monitoring; laser signal; measurement accuracy; melt surface; molten surface; operating theory; photo detector; small wave amplitude; spatial distribution; statistical analysis; statistical means; surface movement; trigonometrical laser monitoring; water; Background noise; Laser modes; Laser noise; Laser theory; Monitoring; Silicon; Statistical analysis; Surface emitting lasers; Surface waves; Wavelength measurement;
fLanguage
English
Journal_Title
Instrumentation and Measurement, IEEE Transactions on
Publisher
ieee
ISSN
0018-9456
Type
jour
DOI
10.1109/19.585441
Filename
585441
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