Title :
Superconducting YBa/sub 2/Cu/sub 3/O/sub 7/ on MgO buffered [100] Si for high frequency applications-buffer layer deposition techniques and processing considerations
Author :
Vlasov, Yu. ; Lacambra, A. ; Soto, R. ; Larkins, G.L., Jr. ; Stampe, P. ; Kennedy, R.
Author_Institution :
Future Aerosp. Sci. & Technol. Center for Space Cyroelectron., Florida Int. Univ., Miami, FL, USA
fDate :
6/1/1999 12:00:00 AM
Abstract :
The use of MgO as a buffer layer between YBa/sub 2/Cu/sub 3/O/sub 7/ and Si has advantages for microwave applications. MgO has a low dielectric constant, small loss tangent and is relatively stable. Silicon as a substrate material is relatively inexpensive and, more importantly, active semiconductive devices can be imbedded in it. This presents certain challenges from a processing point of view in terms of materials compatibility and growth. We have discovered that maintaining a silicon surface free of any native oxide is critical to obtaining acceptable results. As of this writing we are producing 1.5 cm/spl times/1.5 cm films using both PLD and feedback controlled reactive RF sputtering for the MgO followed by PLD deposited YBa/sub 2/Cu/sub 3/O/sub 7/. The resulting films are c-axis oriented and randomly oriented in-plane according to X-ray diffraction data. T/sub C(R=0)/´s of the films are 70-80 K with transition onsets ranging from 82 to 92 K depending on the method of substrate preparation and the deposition parameters. The most recent processing details, full X-ray characterization of the film structures, and some microwave characteristics will be presented and discussed.
Keywords :
X-ray diffraction; barium compounds; high-temperature superconductors; magnesium compounds; pulsed laser deposition; sputter deposition; substrates; superconducting thin films; superconducting transition temperature; yttrium compounds; HTSC; MgO; MgO buffered [100] Si; Si; X-ray characterization; X-ray diffraction; YBa/sub 2/Cu/sub 3/O/sub 7/; active semiconductive devices; buffer layer deposition techniques; c-axis oriented films; deposition parameters; feedback controlled reactive RF sputtering; film structures; growth; high frequency applications; low dielectric constant; materials compatibility; microwave applications; microwave characteristics; processing considerations; randomly oriented in-plane films; small loss tangent; substrate preparation; transition temperature; Adaptive control; Buffer layers; Dielectric constant; Dielectric losses; Dielectric materials; Dielectric substrates; Semiconductor materials; Silicon; Superconducting epitaxial layers; Superconducting microwave devices;
Journal_Title :
Applied Superconductivity, IEEE Transactions on