• DocumentCode
    1547900
  • Title

    Fully Understanding the Mechanism of Misalignment-Induced Narrow-Transistor Failure and Carefully Evaluating the Misalignment-Tolerant SRAM-Cell Layout

  • Author

    Nakai, Satoshi ; Miyazaki, Yasumori ; Yasuda, Makoto

  • Author_Institution
    Fujitsu Semicond., Ltd., Kuwana, Japan
  • Volume
    25
  • Issue
    3
  • fYear
    2012
  • Firstpage
    317
  • Lastpage
    322
  • Abstract
    We have successfully demonstrated a misalignment-tolerant SRAM cell, whose layout has been created from consideration of narrow-transistor failure through physical and electrical analyses. To evaluate an advantage of the layout, we have performed an intentionally misaligned experiment using a test structure with each SRAM block featuring a neighbor alignment-inspection mark. Moreover, utilizing the result of the experiment, we have created a manufacturing-friendly methodology of misalignment-limit determination.
  • Keywords
    SRAM chips; failure analysis; integrated circuit layout; integrated circuit reliability; electrical analysis; manufacturing friendly method; misalignment induced narrow transistor failure; misalignment limit determination; misalignment tolerant SRAM cell layout; physical analysis; test structure; Etching; Failure analysis; Layout; Lithography; Logic gates; Random access memory; Transistors; Failure analysis; SRAM chips; integrated circuit layout;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2012.2202769
  • Filename
    6225446