DocumentCode
1547900
Title
Fully Understanding the Mechanism of Misalignment-Induced Narrow-Transistor Failure and Carefully Evaluating the Misalignment-Tolerant SRAM-Cell Layout
Author
Nakai, Satoshi ; Miyazaki, Yasumori ; Yasuda, Makoto
Author_Institution
Fujitsu Semicond., Ltd., Kuwana, Japan
Volume
25
Issue
3
fYear
2012
Firstpage
317
Lastpage
322
Abstract
We have successfully demonstrated a misalignment-tolerant SRAM cell, whose layout has been created from consideration of narrow-transistor failure through physical and electrical analyses. To evaluate an advantage of the layout, we have performed an intentionally misaligned experiment using a test structure with each SRAM block featuring a neighbor alignment-inspection mark. Moreover, utilizing the result of the experiment, we have created a manufacturing-friendly methodology of misalignment-limit determination.
Keywords
SRAM chips; failure analysis; integrated circuit layout; integrated circuit reliability; electrical analysis; manufacturing friendly method; misalignment induced narrow transistor failure; misalignment limit determination; misalignment tolerant SRAM cell layout; physical analysis; test structure; Etching; Failure analysis; Layout; Lithography; Logic gates; Random access memory; Transistors; Failure analysis; SRAM chips; integrated circuit layout;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2012.2202769
Filename
6225446
Link To Document