• DocumentCode
    1548393
  • Title

    Surface resistance of Bi-2212 films fabricated by multitarget sputtering

  • Author

    Otsuka, J. ; Ohbayashi, K. ; Sugihara, Y. ; Senzaki, T. ; Yoshida, M. ; Inoue, M. ; Fujimaki, A. ; Hayakawa, H.

  • Author_Institution
    R&D Center, NGK Spark Plug Co. Ltd., Aichi, Japan
  • Volume
    9
  • Issue
    2
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    2183
  • Lastpage
    2186
  • Abstract
    We investigated the surface resistance of Bi-2212 films fabricated by the multitarget sputtering method. The surface resistance was not dependent on the product of the grain size and the critical current density, although many high temperature superconductors such as Y-Ba-Cu-O agree with such a weak-link model. Therefore, it is possible that the conduction losses are relatively low at grain boundaries in Bi-Sr-Ca-Cu-O. On the other hand, it was found that the intergrowth of Bi-2212 with Bi-2201 or Bi-2223 influenced the surface resistance badly. This is very interesting, although it has never been clarified as to why the surface resistance is dependent on the intergrowth. Further study will be required in order to interpret the behavior of the surface resistance of BSCCO.
  • Keywords
    bismuth compounds; calcium compounds; ceramics; critical current density (superconductivity); grain boundaries; grain size; high-temperature superconductors; sputter deposition; sputtered coatings; strontium compounds; superconducting thin films; Bi-2212 films; Bi-Sr-Ca-Cu-O; Y-Ba-Cu-O; conduction losses; critical current density; grain boundaries; grain size; high temperature superconductors; multitarget sputtering; surface resistance; weak-link model; Bismuth compounds; Critical current density; Grain boundaries; Grain size; High temperature superconductors; Sputtering; Superconducting films; Superconducting microwave devices; Surface resistance; Yttrium barium copper oxide;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.784901
  • Filename
    784901