DocumentCode :
1548804
Title :
Precise characterization of long-distance mismatch of CMOS devices
Author :
Schaper, Ulrich ; Linnenbank, Carsten G. ; Thewes, Roland
Author_Institution :
Corporate Frontends CFE TD SIM, Infineon Technol. AG, Munich, Germany
Volume :
14
Issue :
4
fYear :
2001
fDate :
11/1/2001 12:00:00 AM
Firstpage :
311
Lastpage :
317
Abstract :
A new test structure is presented for the characterization of long-distance mismatch of complimentary metal-oxide-semiconductor (CMOS) devices. A single circuit is used to characterize both transistors and resistors. High resolution is achieved by applying a four-terminal method with regulated reference potential to compensate for parasitic resistance effects. Measured data are presented for 0.5-, 0.35-, and 0.25-μm CMOS processes to demonstrate the performance of this approach. In particular, the long distance matching behavior is compared to that of neighboring devices. Examples for linear and nonlinear distance dependencies are shown. The long-distance mismatch has to be taken into account in circuit designs with short channel transistors and with narrow resistors
Keywords :
MOSFET; resistors; semiconductor device testing; 0.25 micron; 0.35 micron; 0.5 micron; CMOS device; circuit design; four-terminal method; long-distance mismatch; narrow resistor; parasitic resistance; reference potential; short channel transistor; test structure; CMOS process; Circuits; Clocks; Electrical resistance measurement; Flip-flops; MOSFETs; Resistors; Shift registers; Testing; Voltage;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.964318
Filename :
964318
Link To Document :
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