DocumentCode
1548804
Title
Precise characterization of long-distance mismatch of CMOS devices
Author
Schaper, Ulrich ; Linnenbank, Carsten G. ; Thewes, Roland
Author_Institution
Corporate Frontends CFE TD SIM, Infineon Technol. AG, Munich, Germany
Volume
14
Issue
4
fYear
2001
fDate
11/1/2001 12:00:00 AM
Firstpage
311
Lastpage
317
Abstract
A new test structure is presented for the characterization of long-distance mismatch of complimentary metal-oxide-semiconductor (CMOS) devices. A single circuit is used to characterize both transistors and resistors. High resolution is achieved by applying a four-terminal method with regulated reference potential to compensate for parasitic resistance effects. Measured data are presented for 0.5-, 0.35-, and 0.25-μm CMOS processes to demonstrate the performance of this approach. In particular, the long distance matching behavior is compared to that of neighboring devices. Examples for linear and nonlinear distance dependencies are shown. The long-distance mismatch has to be taken into account in circuit designs with short channel transistors and with narrow resistors
Keywords
MOSFET; resistors; semiconductor device testing; 0.25 micron; 0.35 micron; 0.5 micron; CMOS device; circuit design; four-terminal method; long-distance mismatch; narrow resistor; parasitic resistance; reference potential; short channel transistor; test structure; CMOS process; Circuits; Clocks; Electrical resistance measurement; Flip-flops; MOSFETs; Resistors; Shift registers; Testing; Voltage;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.964318
Filename
964318
Link To Document