• DocumentCode
    1548804
  • Title

    Precise characterization of long-distance mismatch of CMOS devices

  • Author

    Schaper, Ulrich ; Linnenbank, Carsten G. ; Thewes, Roland

  • Author_Institution
    Corporate Frontends CFE TD SIM, Infineon Technol. AG, Munich, Germany
  • Volume
    14
  • Issue
    4
  • fYear
    2001
  • fDate
    11/1/2001 12:00:00 AM
  • Firstpage
    311
  • Lastpage
    317
  • Abstract
    A new test structure is presented for the characterization of long-distance mismatch of complimentary metal-oxide-semiconductor (CMOS) devices. A single circuit is used to characterize both transistors and resistors. High resolution is achieved by applying a four-terminal method with regulated reference potential to compensate for parasitic resistance effects. Measured data are presented for 0.5-, 0.35-, and 0.25-μm CMOS processes to demonstrate the performance of this approach. In particular, the long distance matching behavior is compared to that of neighboring devices. Examples for linear and nonlinear distance dependencies are shown. The long-distance mismatch has to be taken into account in circuit designs with short channel transistors and with narrow resistors
  • Keywords
    MOSFET; resistors; semiconductor device testing; 0.25 micron; 0.35 micron; 0.5 micron; CMOS device; circuit design; four-terminal method; long-distance mismatch; narrow resistor; parasitic resistance; reference potential; short channel transistor; test structure; CMOS process; Circuits; Clocks; Electrical resistance measurement; Flip-flops; MOSFETs; Resistors; Shift registers; Testing; Voltage;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.964318
  • Filename
    964318