• DocumentCode
    1549060
  • Title

    Numerical simulation of the residual charge of vacuum interrupters

  • Author

    Gilles, René ; Weltmann, Klaus-Dieter ; Schade, Ekkehard ; Claessens, Max

  • Author_Institution
    ABB Corporate Res. Ltd, Baden-Daettwil, Switzerland
  • Volume
    29
  • Issue
    5
  • fYear
    2001
  • fDate
    10/1/2001 12:00:00 AM
  • Firstpage
    754
  • Lastpage
    758
  • Abstract
    The amount of charge carriers remaining in the switching gap of the vacuum interrupter (VI) at current zero, called residual charge (RC), is simulated numerically. Corresponding rate equations of the arc plasma were solved in combination with the development of anode surface temperature and metal vapor emission. The arc plasma is assumed to consist of "fast ions" and "slow ions." Production of "slow" ions results from charge exchange between ions and vapor atoms. At low arcing loads, the "fast" ion component prevails and RC depends only on the current decay rate at current zero. Density of "slow" ions, and consequently, RC, increases drastically when melting of the contacts and metal vapor emission occurs. The numerical results, i.e., the RC in dependence of arcing load as well as the time-behavior during free recovery, are in considerable agreement with experiments. Application of synthetic circuit testing is compared to direct testing of vacuum interrupters
  • Keywords
    plasma heating; plasma simulation; plasma transport processes; vacuum interrupters; anode surface temperature; arc plasma; arcing load; arcing loads; charge carriers; charge exchange; contact heating; contacts; current decay rate; current zero; fast ions; melting; metal vapor emission; numerical simulation; rate equations; residual charge; slow ions; synthetic circuit testing; time behavior; vacuum interrupter; vacuum interrupters; Anodes; Charge carriers; Circuit testing; Equations; Interrupters; Numerical simulation; Plasma density; Plasma simulation; Plasma temperature; Production;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.964469
  • Filename
    964469