Title :
Recent developments in vacuum arc deposition
Author :
Boxman, Raymond L.
Author_Institution :
Fleischman Fac. of Eng., Tel Aviv Univ., Israel
fDate :
10/1/2001 12:00:00 AM
Abstract :
Vacuum arc deposition (VAD) has become an established industrial art for producing hard, wear-resistant and decorative coatings. Sophisticated coatings, including tertiary compounds and multilayers, are increasingly used. Filtered VAD and hot electrode vacuum arcs are increasingly investigated to obtain high-quality, macroparticle-free films. Improved filtered sources, including large rectangular filters, have been demonstrated. Besides tool coatings, films for metallizing integrated circuits and protecting magnetic media are being developed
Keywords :
reviews; vacuum arcs; vacuum deposition; cathodic arc; decorative coatings; filtered sources; filtered vacuum arc deposition; hard coatings; hot electrode vacuum arcs; industrial art; integrated circuits; large rectangular filters; macroparticle-free films; magnetic media; metallizing; multilayers; protective coatings; tertiary compounds; thin films; tool coatings; wear-resistant coatings; Art; Coatings; Electrodes; Filters; Integrated circuit metallization; Magnetic films; Magnetic multilayers; Magnetic separation; Protection; Vacuum arcs;
Journal_Title :
Plasma Science, IEEE Transactions on
