DocumentCode :
1549084
Title :
Systematic approach to modelling and parameter extraction of an ion-implanted GaAs MESFET
Author :
Kwok, H.L. ; Wang, Z.I.
Author_Institution :
Dept. of Electr. & Comput. Eng., Victoria Univ., BC, Canada
Volume :
146
Issue :
2
fYear :
1999
fDate :
4/1/1999 12:00:00 AM
Firstpage :
95
Lastpage :
98
Abstract :
The authors have modelled current/voltage characteristics of GaAs MESFETs built on ion-implanted substrates. It is shown that, for a physically acceptable model, some of the parameters should be voltage-dependent. This would account for the dopant nonuniformity in the channel and two-dimensional effects. For a very simple model, a minimum of five voltage-independent parameters was required (this number increased to six if large biases were considered). To validate the model, a procedure is proposed for parameter extraction under different bias and implant conditions
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; ion implantation; semiconductor device models; GaAs; bias conditions; channel dopant nonuniformity; current/voltage characteristics; implant conditions; ion-implanted GaAs MESFET; ion-implanted substrates; modelling; parameter extraction; two-dimensional effects; voltage-independent parameters;
fLanguage :
English
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2409
Type :
jour
DOI :
10.1049/ip-cds:19990167
Filename :
785302
Link To Document :
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