DocumentCode :
1549429
Title :
Full-wave analysis of coplanar waveguides by variational conformal mapping technique
Author :
Chang, Chia-Nan ; Wong, Yu-Ching ; Chen, Chun Hsiung
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
38
Issue :
9
fYear :
1990
fDate :
9/1/1990 12:00:00 AM
Firstpage :
1339
Lastpage :
1344
Abstract :
A new full-wave analysis of coplanar waveguides is presented. The modified mapping technique of C.P. Wen (1969) is used to map the original infinite domain into a finite image domain and also to account for the singularity of fields near the conductor edges. The finite thickness of the dielectric substrate is considered together with the assumptions of lossless guides and negligible metallization thickness. The current distributions on the center signal strip as well as the tangential electric fields over the slot along the air-dielectric interface are examined. Numerical results for the frequency-dependent effective dielectric constants and characteristic impedances of coplanar waveguides are presented. Particular attention is given to the electric field distributions over the air-dielectric interface of slots and the current distributions of the signal strip
Keywords :
waveguide theory; waveguides; CPW; air-dielectric interface; characteristic impedances; conductor edges; coplanar waveguides; current distributions; dielectric substrate thickness; electric field distributions; finite image domain; frequency-dependent effective dielectric constants; full-wave analysis; lossless guides; mapping technique; metallization thickness; singularity of fields; tangential electric fields; variational conformal mapping technique; Conductors; Coplanar waveguides; Current distribution; Dielectric constant; Dielectric losses; Dielectric substrates; Frequency; Impedance; Metallization; Strips;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/22.58662
Filename :
58662
Link To Document :
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