Title :
1.3-μm InAsP n-type modulation-doped MQW lasers grown by gas-source molecular beam epitaxy
Author :
Shimizu, Hitoshi ; Kumada, Kouji ; Yamanaka, Nobumitsu ; Iwai, Nirihiro ; Mukaihara, Toshikazu ; Kasukawa, Akihiko
Author_Institution :
R&D Lab., Furukawa Electr. Co. Ltd., Yokohama, Japan
Abstract :
The effect of n-type modulation doping as well as growth temperature on the threshold current density of 1.3-μm InAsP strained multiple-quantum-well (MQW) lasers grown by gas-source molecular beam epitaxy (GSMBE) was investigated for the first time. We have obtained threshold current density as low as 250 A/cm2 for 1200-μm long devices. The threshold current density per well for infinite cavity length Jth/Nw∞ of 57 A/cm2 was obtained for the optimum n-doping density (ND=1×1018 cm-3) and the optimum growth temperature (515°C for InP and 455°C for the SCH-MQW region), which is about 30% reduction as compared with that of undoped MQW lasers. A very low continuous-wave threshold current of 0.9 mA have been obtained at room temperature, which is the lowest ever reported for long-wavelength lasers using n-type modulation doping, and the lowest results grown by all kinds of MBE in the long-wavelength region. The differential gain was estimated by the measurement of relative intensity noise. No significant reduction of differential gain was observed for n-type MD-MQW lasers as compared with undoped MQW lasers. The carrier lifetime was also reduced by about 33% by using n-type MD-MQW lasers. Both reduction of the threshold current and the carrier lifetime lead to the reduction of the turn-on delay time by about 30%. The 1.3-μm InAsP strained MQW lasers using n-type modulation doping with very low power consumption and small turn-on delay is very attractive for laser array application in high-density parallel optical interconnection systems
Keywords :
III-V semiconductors; carrier lifetime; current density; indium compounds; infrared sources; laser cavity resonators; laser transitions; molecular beam epitaxial growth; optimisation; quantum well lasers; semiconductor doping; semiconductor growth; 1.3 mum; 1.3-μm InAsP n-type modulation-doped MQW lasers; 1200 mum; 455 C; 515 C; InAsP; carrier lifetime; differential gain; gas-source molecular beam epitaxy; growth temperature; high-density parallel optical interconnection systems; infinite cavity length; laser array application; n-type modulation doping; optimum growth temperature; optimum n-doping density; relative intensity noise; threshold current density; turn-on delay time; very low continuous-wave threshold current; very low power consumption; Charge carrier lifetime; Delay; Epitaxial layers; Gas lasers; Laser noise; Molecular beam epitaxial growth; Power lasers; Quantum well devices; Temperature; Threshold current;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/2944.788404