• DocumentCode
    1550668
  • Title

    Room-temperature continuous-wave operation of 1.24-μm GaInNAs lasers grown by metal-organic chemical vapor deposition

  • Author

    Sato, Shunichi ; Satoh, Shiro

  • Author_Institution
    Gen. Electron. Res. & Dev. Center, Ricoh Co. Ltd., Miyagi, Japan
  • Volume
    5
  • Issue
    3
  • fYear
    1999
  • Firstpage
    707
  • Lastpage
    710
  • Abstract
    Room-temperature continuous-wave operation is demonstrated for the first time in a GaInNAs-GaAs laser grown by metal-organic chemical vapor deposition. A low-threshold current density of 660 A/cm2 and a high characteristic temperature of 113 K emitting at 1.245 μm is achieved. Emitting at the longest wavelength of 1.225 μm is also demonstrated in a highly strained GaInAs-GaAs double-quantum-well laser on a GaAs substrate by increasing the In content up to 39%. A low-threshold current density of about 200 A/cm2 in a wavelength range up to 1.2 μm is achieved
  • Keywords
    III-V semiconductors; MOCVD; current density; gallium arsenide; indium compounds; infrared sources; laser transitions; optical fabrication; quantum well lasers; 1.24 mum; 1.245 mum; 113 K; GaAs substrate; GaInNAs; GaInNAs lasers; In content; high characteristic temperature; highly strained GaInAs-GaAs double-quantum-well laser; low-threshold current density; metal-organic chemical vapor deposition; room-temperature continuous-wave operation; Chemical lasers; Chemical vapor deposition; Gallium arsenide; MOCVD; Nitrogen; Pulsed laser deposition; Quantum well lasers; Semiconductor lasers; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/2944.788439
  • Filename
    788439