DocumentCode :
1550980
Title :
Demonstration of InGaN Light-Emitting Diodes by Incorporating a Self-Textured Oxide Mask Structure
Author :
Lin, Wen-Yu ; Wuu, Dong-Sing ; Huang, Shih-Cheng ; Lo, Shih-Yung ; Liu, Chien-Min ; Horng, Ray-Hua
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chung Hsing Univ., Taichung, Taiwan
Volume :
23
Issue :
17
fYear :
2011
Firstpage :
1240
Lastpage :
1242
Abstract :
A 460-nm InGaN light-emitting diode (LED) with a self-textured oxide mask (STOM) array structure upon an additional low-temperature GaN interlayer is demonstrated. As compared with a conventional LED, the electroluminescence (EL) spectrum of an STOM-LED displays a manifest peak profile without Fabry-Pérot interference fringes, one-fold increment in EL intensity, and 43% enhancement in total output power at an injection current of 20 mA. High-density light-emitting dots across the STOM-LED surface are discovered at a small injection current of 20 μA because the STOM array can act as scattering centers to enhance the light extraction.
Keywords :
III-V semiconductors; electroluminescence; gallium compounds; indium compounds; light emitting diodes; light interference; light scattering; masks; optical arrays; wide band gap semiconductors; Fabry-Perot interference fringes; InGaN; current 20 mA; electroluminescence; high-density light-emitting dots; injection current; light extraction; light output power; light scattering; light-emitting diodes; low-temperature interlayer; self-textured oxide mask array structure; wavelength 469 nm; Arrays; Epitaxial layers; Gallium nitride; Light emitting diodes; Scanning electron microscopy; Substrates; Surface morphology; Fabry–Pérot; InGaN; light-emitting diode (LED); oxide;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2011.2158992
Filename :
5871684
Link To Document :
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