Title :
A comparison of strong and weak distributed transverse coupling between VLSI interconnects
Author_Institution :
Dept. of Electr. & Electron. Eng., Eastern Mediterranean Univ., Mersin, Cyprus
fDate :
12/1/2001 12:00:00 AM
Abstract :
Crosstalk under strong and weak coupling is compared and the two cases are shown to be identical for the important low-frequency range, where the significant components of the input excitation lie. The validity of weak coupling is established in terms of rise time and physical length of interconnects
Keywords :
VLSI; crosstalk; integrated circuit interconnections; VLSI interconnect; distributed transverse coupling; low-frequency crosstalk; physical length; rise time; strong coupling; weak coupling; Capacitance; Coupling circuits; Crosstalk; Impedance; Inductance; Integrated circuit interconnections; Integrated circuit technology; Routing; Very large scale integration; Wire;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
