• DocumentCode
    1552159
  • Title

    A comparison of strong and weak distributed transverse coupling between VLSI interconnects

  • Author

    Özkaramanli, H.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Eastern Mediterranean Univ., Mersin, Cyprus
  • Volume
    20
  • Issue
    12
  • fYear
    2001
  • fDate
    12/1/2001 12:00:00 AM
  • Firstpage
    1472
  • Lastpage
    1478
  • Abstract
    Crosstalk under strong and weak coupling is compared and the two cases are shown to be identical for the important low-frequency range, where the significant components of the input excitation lie. The validity of weak coupling is established in terms of rise time and physical length of interconnects
  • Keywords
    VLSI; crosstalk; integrated circuit interconnections; VLSI interconnect; distributed transverse coupling; low-frequency crosstalk; physical length; rise time; strong coupling; weak coupling; Capacitance; Coupling circuits; Crosstalk; Impedance; Inductance; Integrated circuit interconnections; Integrated circuit technology; Routing; Very large scale integration; Wire;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/43.969441
  • Filename
    969441
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1552159