Dielectrics in MOS devices, DRAM capacitors, and inter-metal isolation

This article provides a summary of the current state of the art in the field of dielectric/integrated circuit technology. More specifically, this article will cover the use of dielectrics in MOS devices, DRAM capacitors, and intermetal isolation. First, a brief history on the use of dielectrics in integrated circuits is provided to the reader. Then, the reader is presented with the basic physics that govern the properties of dielectrics. The reader is then provided with a detailed description of the use of dielectrics in connection with MOS devices, DRAM capacitors, and intermetal isolation individually. In addition, the reader is presented a summary of the current state of the art for dielectrics through an examination of the recent U.S. patents issued in this field of technology. Finally, a presentation on the future use of dielectrics in combination with integrated circuits is made.