Title :
Increased-area oxidised single-fundamental mode VCSEL with self-aligned shallow etched surface relief
Author :
Unold, H.J. ; Grabherr, M. ; Eberhard, F. ; Mederer, F. ; Jager, R. ; Riedl, M. ; Ebeling, K.J.
Author_Institution :
Dept. of Optoelectron., Ulm Univ., Germany
fDate :
8/5/1999 12:00:00 AM
Abstract :
A self-aligning fabrication process is presented for enhancing the fundamental singlemode emission of selectively oxidised vertical cavity surface emitting lasers using a surface relief etching technique. The mechanism underlying the increase in threshold gain due to the use of a shallow surface relief is described and the results obtained for a 7 μm device at 850 nm are presented
Keywords :
etching; laser modes; oxidation; surface emitting lasers; 7 micron; 850 nm; fundamental singlemode emission; selectively oxidised vertical cavity surface emitting lasers; self-aligned shallow etched surface relief; single-fundamental mode VCSEL; threshold gain;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19990952
