Title :
High-input-power-allowable uni-travelling-carrier waveguide photodiodes with semi-insulating-InP buried structure
Author :
Yuda, M. ; Kato, K. ; Iga, R. ; Mitsuhara, M.
Author_Institution :
NTT Photonics Labs., Kanagawa, Japan
fDate :
8/5/1999 12:00:00 AM
Abstract :
A semi-insulating InP buried structure is applied to a uni-travelling-carrier waveguide photodiode to enable the device to receive high input power by dispersing the heat generated from the waveguide-mesa region. The product of the photocurrent and applied voltage, which indicates the allowable level of input power, is four times higher than that of a polyimide-passivated mesa structure. The device has a product of ~120 mW (23.5 mA×5 V), a responsivity of 0.7 A/W, and a bandwidth of 47 GHz
Keywords :
III-V semiconductors; buried layers; indium compounds; optical waveguide components; photodiodes; InP; input power; semi-insulating InP buried structure; uni-travelling-carrier waveguide photodiode;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19990961