DocumentCode :
1554229
Title :
On the amplification mechanism of the ion-channel laser
Author :
Chen, Kuan-Ren ; Katsouleas, Thomas C. ; Dawson, John M.
Author_Institution :
Dept. of Phys., California Univ., Los Angeles, CA, USA
Volume :
18
Issue :
5
fYear :
1990
fDate :
10/1/1990 12:00:00 AM
Firstpage :
837
Lastpage :
841
Abstract :
The amplification mechanism of the ion-channel laser (ICL) in the low-gain regime is studied. In this concept, a relativistic electron beam is injected into a plasma whose density is comparable to or lower than the beam´s density. The head of the electron beam pushes out the plasma electrons, leaving an ion channel. The ion-focusing force causes the electrons to oscillate (betatron oscillations) about the axis and plays a role similar to the magnetic field in a cyclotron autoresonance maser (CARM). Radiation can be produced with wave frequencies from microwaves to X-rays depending on the beam energy and plasma density: ω~2γ3/2ωpe, where γ is the Lorentz factor of the beam and ωpe is the plasma frequency. Transverse (relativistic) bunching and axial (conventional) bunching are the amplification mechanisms in ICLs; only the latter effect operates in free-electron lasers. The competition of these two bunching mechanisms depends on beam velocity ν0z; their dependences on ν0z cancel for the cyclotron autoresonance masers. A linear theory is developed to study the physical mechanisms, and a PIC (particle-in-cell) simulation code is used to verify the theory. The mechanism is examined as a possible explanation for experimentally observed millimeter radiation from relativistic electron beams interacting with plasmas
Keywords :
electron beam effects; ion lasers; plasma density; plasma-beam interactions; amplification mechanism; beam energy; cyclotron autoresonance maser; ion-channel laser; ion-focusing force; particle-in-cell simulation; plasma; plasma density; relativistic electron beam; Cyclotrons; Electron beams; Free electron lasers; Frequency; Laser beams; Masers; Particle beams; Plasma density; Plasma waves; Plasma x-ray sources;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.62351
Filename :
62351
Link To Document :
بازگشت