Title :
Photonic crystal polarisation splitters
Author :
Ohtera, Y. ; Sato, T. ; Kawashima, T. ; Tamamura, T. ; Kawakami, S.
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
fDate :
7/22/1999 12:00:00 AM
Abstract :
The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ=1.55 μm are 0.4 dB and >40 dB, respectively
Keywords :
light polarisation; optical beam splitters; optical communication equipment; optical fabrication; optical multilayers; optical testing; photonic band gap; silicon; silicon compounds; sputter deposition; sputter etching; sputtered coatings; 1.55 mum; Si-SiO2; a-Si/SiO2 photonic crystal polarisation splitter; corrugated multilayer film; design; extinction ratio; fabrication; insertion loss; measurement; sputter-deposition; sputter-etching;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19990875
