• DocumentCode
    1555120
  • Title

    15 GHz fmax microwave silicon p-n- rho transistors with single-crystal emitters fabricated with simple four mask process

  • Author

    Hebert, Francois ; Wholey, J. ; Snapp, C. ; Garcia, Alvaro

  • Author_Institution
    Adv. Bipolar Products, AV ANTEK Inc., Newark, CA, USA
  • Volume
    27
  • Issue
    20
  • fYear
    1991
  • Firstpage
    1886
  • Lastpage
    1888
  • Abstract
    Vertical p-n- rho transistors have been fabricated using a four mask, low cost quasi-selfaligned process with submicrometre feature sizes. The resulting monocrystalline emitter devices achieve ft greater than 9 GHz and fmax greater than 15 GHz with BVceo greater than 13 V. These discrete p-n- rho ´s were used successfully as active loads for a monolithic n- rho -n opamp to achieve a gain-bandwidth product of 4.4 GHz.
  • Keywords
    bipolar transistors; elemental semiconductors; silicon; solid-state microwave devices; 15 GHz; SHF; active loads; four mask process; microwave transistors; monocrystalline emitter devices; p-n- rho transistors; quasi-selfaligned process; single-crystal emitters; submicrometre feature sizes; vertical p-n- rho transistors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19911169
  • Filename
    97235