DocumentCode
1555120
Title
15 GHz fmax microwave silicon p-n- rho transistors with single-crystal emitters fabricated with simple four mask process
Author
Hebert, Francois ; Wholey, J. ; Snapp, C. ; Garcia, Alvaro
Author_Institution
Adv. Bipolar Products, AV ANTEK Inc., Newark, CA, USA
Volume
27
Issue
20
fYear
1991
Firstpage
1886
Lastpage
1888
Abstract
Vertical p-n- rho transistors have been fabricated using a four mask, low cost quasi-selfaligned process with submicrometre feature sizes. The resulting monocrystalline emitter devices achieve ft greater than 9 GHz and fmax greater than 15 GHz with BVceo greater than 13 V. These discrete p-n- rho ´s were used successfully as active loads for a monolithic n- rho -n opamp to achieve a gain-bandwidth product of 4.4 GHz.
Keywords
bipolar transistors; elemental semiconductors; silicon; solid-state microwave devices; 15 GHz; SHF; active loads; four mask process; microwave transistors; monocrystalline emitter devices; p-n- rho transistors; quasi-selfaligned process; single-crystal emitters; submicrometre feature sizes; vertical p-n- rho transistors;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19911169
Filename
97235
Link To Document