A mode projecting method for the quasi-static analysis of electrooptic device electrodes considering finite metallization thickness and anisotropic substrate

Author

Jin, Hang ; Vahldieck, Ruediger ; Bèlanger, Michel ; Jacubczyk, Zdzislaw

Author_Institution

Dept. of Electr. & Compuf. Eng., Victoria Univ., BC, Canada

Volume

27

Issue

10

fYear

1991

fDate

10/1/1991 12:00:00 AM

Firstpage

2306

Lastpage

2314

Abstract

The method presented is an extension of the mode matching method (MMM), utilizing the idea of base transformation and vector projection in inner-product space. In contrast to the conventional MMM, this approach decouples the order of the linear equation system from the truncation index of the mode expansion series and is free from the relative convergence phenomenon of the MMM. Coplanar strip electrodes are analyzed, and the effects of the metallization thickness, buffer layer, and conducting enclosure on the effective permittivity, characteristic impedance, and electric field in the substrate are presented

Keywords

electro-optical devices; electrodes; integrated optics; optical waveguide theory; refractive index; anisotropic substrate; base transformation; buffer layer; characteristic impedance; conducting enclosure; coplanar strip electrodes; effective permittivity; electric field; electro-optic modulators; electrooptic device electrodes; finite metallization thickness; inner-product space; linear equation order decoupling; linear equation system; metallization thickness; mode expansion series; mode matching method; mode projecting method; quasi-static analysis; truncation index; vector projection; Buffer layers; Convergence; Electrodes; Equations; Impedance; Metallization; Mode matching methods; Permittivity; Strips; Vectors;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.97274

Filename

97274