DocumentCode
1555780
Title
Applications of a theoretical model for line width control in photoresists sensitised by a laser beam
Author
Fremont, H. ; N´Kaoua, Gilles ; Danto, Y.
Volume
33
Issue
12
fYear
1997
fDate
6/5/1997 12:00:00 AM
Firstpage
1049
Lastpage
1051
Abstract
Various applications are presented of a lithography machine designed for laser direct patterning of metallisation in MCM or ASICs. The experimental setup conditions are largely simplified by theoretical calculation of the line width etched in the photoresist after its exposure and development
Keywords
application specific integrated circuits; integrated circuit metallisation; laser materials processing; metallisation; multichip modules; photolithography; photoresists; ASIC; MCM; laser beam sensitisation; laser direct patterning; line width control; lithography machine; metallisation; photoresists; theoretical model;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19970738
Filename
588432
Link To Document