Title :
Applications of a theoretical model for line width control in photoresists sensitised by a laser beam
Author :
Fremont, H. ; N´Kaoua, Gilles ; Danto, Y.
fDate :
6/5/1997 12:00:00 AM
Abstract :
Various applications are presented of a lithography machine designed for laser direct patterning of metallisation in MCM or ASICs. The experimental setup conditions are largely simplified by theoretical calculation of the line width etched in the photoresist after its exposure and development
Keywords :
application specific integrated circuits; integrated circuit metallisation; laser materials processing; metallisation; multichip modules; photolithography; photoresists; ASIC; MCM; laser beam sensitisation; laser direct patterning; line width control; lithography machine; metallisation; photoresists; theoretical model;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19970738
