DocumentCode
1555962
Title
High current, thin silicon-on-ceramic solar cell
Author
Ford, David H. ; Rand, James A. ; Delledonne, Emanuel J. ; Ingram, Alan E. ; Bisaillon, John C. ; Feyock, Bryan W. ; Mauk, Michael G. ; Hall, Robert B. ; Barnett, Allen M.
Author_Institution
AstroPower Inc., Newark, DE, USA
Volume
46
Issue
10
fYear
1999
fDate
10/1/1999 12:00:00 AM
Firstpage
2162
Lastpage
2164
Abstract
Thin-film polycrystalline silicon solar cells offer the potential to achieve 19% efficient photovoltaic power conversion. Well-designed, 20-100 micron thick, thin-film silicon solar cells can achieve high efficiency by employing light trapping and back surface passivation. Low cost is achieved by minimizing the amount of feedstock silicon required per watt of power output. Electrically insulating supporting substrates enable monolithic, series-connected submodules. A solar cell device comprised of a 20 micron thick layer of silicon grown on an insulating ceramic substrate, designed to effect light-trapping and back surface passivation, has resulted in an independently verified short circuit current of 25.8 mA/cm2. Analysis of the spectral response of the solar cell indicates the presence of both light-trapping and back surface passivation with an effective diffusion length in excess of twice the device thickness
Keywords
carrier lifetime; ceramics; elemental semiconductors; passivation; semiconductor thin films; short-circuit currents; silicon; solar cells; 19 percent; 20 mum; Si; back surface passivation; effective diffusion length; electrically insulating supporting substrates; high efficiency; insulating ceramic substrate; light trapping; low cost; monolithic series-connected submodules; photovoltaic power conversion; polysilicon-on-ceramic thin film solar cell; short circuit current; spectral response; thin-film polycrystalline Si solar cells; Costs; Dielectrics and electrical insulation; Passivation; Photovoltaic cells; Photovoltaic systems; Power conversion; Semiconductor thin films; Silicon; Solar power generation; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.792012
Filename
792012
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