DocumentCode
1557160
Title
Determining dominant breakdown mechanisms in InP HEMTs
Author
Somerville, Mark H. ; Putnam, Chris S. ; del Alamo, Jesús A.
Author_Institution
Franklin W. Olin Coll. of Eng., Needham Heights, MA, USA
Volume
22
Issue
12
fYear
2001
Firstpage
565
Lastpage
567
Abstract
We present a new technique for determining the dominant breakdown mechanism in InAlAs-InGaAs high-electron mobility transistors. By exploiting both the temperature dependence and the bias dependence of different physical mechanisms, we are able to discriminate impact ionization gate current from tunneling and thermionic field emission gate current in these devices. Our results suggest that the doping level of the supply layers plays a key role in determining the relative importance of these two effects.
Keywords
III-V semiconductors; aluminium compounds; electric current; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; semiconductor device breakdown; semiconductor device measurement; thermionic emission; tunnelling; HEMT; InAlAs-InGaAs; InAlAs-InGaAs high-electron mobility transistors; InP; InP HEMTs; bias dependence; dominant breakdown mechanisms; doping level; impact ionization gate current; physical mechanisms; supply layers; temperature dependence; thermionic field emission gate current; tunneling gate current; Doping; Electric breakdown; HEMTs; Impact ionization; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Temperature dependence; Tunneling;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.974578
Filename
974578
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