• DocumentCode
    1557160
  • Title

    Determining dominant breakdown mechanisms in InP HEMTs

  • Author

    Somerville, Mark H. ; Putnam, Chris S. ; del Alamo, Jesús A.

  • Author_Institution
    Franklin W. Olin Coll. of Eng., Needham Heights, MA, USA
  • Volume
    22
  • Issue
    12
  • fYear
    2001
  • Firstpage
    565
  • Lastpage
    567
  • Abstract
    We present a new technique for determining the dominant breakdown mechanism in InAlAs-InGaAs high-electron mobility transistors. By exploiting both the temperature dependence and the bias dependence of different physical mechanisms, we are able to discriminate impact ionization gate current from tunneling and thermionic field emission gate current in these devices. Our results suggest that the doping level of the supply layers plays a key role in determining the relative importance of these two effects.
  • Keywords
    III-V semiconductors; aluminium compounds; electric current; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; semiconductor device breakdown; semiconductor device measurement; thermionic emission; tunnelling; HEMT; InAlAs-InGaAs; InAlAs-InGaAs high-electron mobility transistors; InP; InP HEMTs; bias dependence; dominant breakdown mechanisms; doping level; impact ionization gate current; physical mechanisms; supply layers; temperature dependence; thermionic field emission gate current; tunneling gate current; Doping; Electric breakdown; HEMTs; Impact ionization; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Temperature dependence; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.974578
  • Filename
    974578