• DocumentCode
    1557538
  • Title

    Equivalent doping profile transformation: a semi-empirical, analytical method for predicting breakdown characteristics of an approximate single-diffused parallel-plane junction

  • Author

    He, Jin ; Zhang, Xing ; Wang, Yangyuan

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • Volume
    48
  • Issue
    12
  • fYear
    2001
  • fDate
    12/1/2001 12:00:00 AM
  • Firstpage
    2763
  • Lastpage
    2768
  • Abstract
    In this paper, a semi-empirical analytical method called the equivalent doping profile transformation method (EDPTM) has been proposed for the first time to predict the breakdown characteristics of an approximate single-diffused parallel-plane pn-junction that has a doping profile of the combination of a diffused side linear gradient constant and a constant substrate doping concentration, which considers the influence of the diffusion gradient level on the space charge region of the substrate side. Through the equivalent doping profile transformation, this approximate pn-junction turns into a double-sided asymmetric linear-graded junction (Jin et al., 1999). As a result, the breakdown voltage, critical peak electrical field, and the maximum depletion layer width can be carefully evaluated at different doping substrate concentration and gradient constant combinations. Compared with previous approximations such as abrupt and classical symmetrical linear-graded junctions, this method can give exact breakdown characteristics of a single-diffused pn-junction. The results are in excellent agreement with the numerical analysis, which proves the validity of this new method
  • Keywords
    diffusion; doping profiles; electric breakdown; numerical analysis; p-n junctions; space charge; EDPTM; approximate pn-junction; approximate single-diffused parallel-plane pn-junction; asymmetric linear-graded pn-junction; breakdown characteristics; breakdown voltage; constant substrate doping concentration; critical peak electrical field; diffused gradient constant; diffused pn-junction; diffused side linear gradient constant; diffusion gradient level; doping concentration; doping gradient constant; doping profile; doping substrate concentration; equivalent doping profile transformation; equivalent doping profile transformation method; maximum depletion layer width; numerical analysis; power devices; semi-empirical analytical method; single-diffused pn-junction; space charge region; Closed-form solution; Doping profiles; Electric breakdown; Helium; Linear approximation; Microelectronics; Numerical analysis; Space charge; Substrates; Turning;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.974701
  • Filename
    974701