DocumentCode :
1557682
Title :
Two-dimensional quantum effects in nanoscale MOSFETs
Author :
Pirovano, Agostino ; Lacaita, Andrea L. ; Spinelli, Alessandro S.
Author_Institution :
Dipt. di Elettronica e Inf., Politecnico di Milano, Italy
Volume :
49
Issue :
1
fYear :
2002
fDate :
1/1/2002 12:00:00 AM
Firstpage :
25
Lastpage :
31
Abstract :
In this paper, a full two-dimensional (2-D) quantum mechanical (QM) device simulator for deep submicron MOSFETs is presented. The model couples a 2-D Schrodinger-Poisson solver with a semiclassical transport model. The validity of the proposed model is first tested against a QM model for transport, developed as a benchmark. Then, QM effects on nanoscale MOSFETs performance are quantitatively addressed and discussed. It is shown that QM effects strongly influence the device performance, namely subthreshold slope drain-induced barrier lowering and short-channel effects. These results show that full QM simulations will become a mandatory issue for nanoscale MOSFETs modeling and design
Keywords :
MOSFET; Poisson equation; Schrodinger equation; inversion layers; nanotechnology; quantum interference phenomena; semiconductor device models; 2D quantum effects; 2D quantum mechanical device simulator; Fermi-Dirac probability distribution; Schrodinger-Poisson solver; charge distribution; device performance; drift-diffusion; finite-element code; nanoscale MOSFET; nonlinear Poisson problem; quantized inversion layer; semiclassical transport model; short-channel effects; threshold slope drain-induced barrier lowering; Benchmark testing; Electrons; MOSFETs; Nanoscale devices; Power dissipation; Quantum mechanics; Schrodinger equation; Silicon; Threshold voltage; Two dimensional displays;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.974744
Filename :
974744
Link To Document :
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