DocumentCode :
1557685
Title :
Breakdown voltage and reverse recovery characteristics of free-standing GaN Schottky rectifiers
Author :
Johnson, J.W. ; Zhang, A.P. ; Luo, Wen-Ben ; Ren, Fan ; Pearton, Stephen J. ; Park, S.S. ; Park, Y.J. ; Chyi, Jenn-Inn
Author_Institution :
Dept. of Chem. Eng., Florida Univ., Gainesville, FL, USA
Volume :
49
Issue :
1
fYear :
2002
fDate :
1/1/2002 12:00:00 AM
Firstpage :
32
Lastpage :
36
Abstract :
Schottky rectifiers with implanted p+ guard ring edge termination fabricated on free-standing GaN substrates show reverse breakdown voltages up to 160 V in vertical geometry devices. The specific on-state resistance was in the range 1.7-3.0 Ω·cm 2, while the turn-on voltage was ~1.8 V. The switching performance was analyzed using the reverse recovery current transient waveform, producing an approximate high-injection, level hole lifetime of ~15 ns. The bulk GaN rectifiers show significant improvement in forward current density and on-state resistance over previous heteroepitaxial devices
Keywords :
III-V semiconductors; Schottky diodes; gallium compounds; power semiconductor diodes; semiconductor device breakdown; solid-state rectifiers; wide band gap semiconductors; 1.8 V; 160 V; GaN; current-voltage characteristics; freestanding Schottky rectifiers; high-injection level hole lifetime; implanted p+ guard ring edge termination; power electronics; reverse breakdown voltages; reverse recovery current transient waveform; specific on-state resistance; switching performance; temperature dependence; vertical geometry devices; Aluminum gallium nitride; Electric breakdown; Electrons; Gallium nitride; Geometry; Power quality; Rectifiers; Substrates; Thermal conductivity; Voltage fluctuations;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.974745
Filename :
974745
Link To Document :
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