Title : 
Comparison of soft-breakdown triggers for large-area capacitors under constant voltage stress
         
        
            Author : 
Schmitz, Jurriaan ; Tuinhout, Hans P. ; Kretschmann, Hennie J. ; Woerlee, Pierre H.
         
        
            Author_Institution : 
Philips Res., Leuven, Belgium
         
        
        
        
        
            fDate : 
9/1/2001 12:00:00 AM
         
        
        
        
            Abstract : 
This work quantitatively compares soft breakdown identification methods for constant voltage stress of large-area nMOS capacitors (up to 10 mm2) with 1.8- to 12-nm gate-oxide thickness (with negative gate voltage). We conclude that in the studied range, breakdown is identified more reliably with a current step trigger than through increased current fluctuation. We present a method to quantify the system background noise, and show results of data filtering algorithms that significantly enhance the ratio between the breakdown signal and background noise level
         
        
            Keywords : 
MOS capacitors; semiconductor device breakdown; semiconductor device noise; background noise; constant voltage stress; current fluctuation; current step trigger; data filtering algorithm; gate oxide; large-area nMOS capacitor; soft breakdown; Background noise; Breakdown voltage; Capacitors; Carbon capture and storage; Dielectric breakdown; Electric breakdown; MOS devices; Probability; Stress; Testing;
         
        
        
            Journal_Title : 
Device and Materials Reliability, IEEE Transactions on
         
        
        
        
        
            DOI : 
10.1109/7298.974830