DocumentCode :
1557891
Title :
Comparison of soft-breakdown triggers for large-area capacitors under constant voltage stress
Author :
Schmitz, Jurriaan ; Tuinhout, Hans P. ; Kretschmann, Hennie J. ; Woerlee, Pierre H.
Author_Institution :
Philips Res., Leuven, Belgium
Volume :
1
Issue :
3
fYear :
2001
fDate :
9/1/2001 12:00:00 AM
Firstpage :
150
Lastpage :
157
Abstract :
This work quantitatively compares soft breakdown identification methods for constant voltage stress of large-area nMOS capacitors (up to 10 mm2) with 1.8- to 12-nm gate-oxide thickness (with negative gate voltage). We conclude that in the studied range, breakdown is identified more reliably with a current step trigger than through increased current fluctuation. We present a method to quantify the system background noise, and show results of data filtering algorithms that significantly enhance the ratio between the breakdown signal and background noise level
Keywords :
MOS capacitors; semiconductor device breakdown; semiconductor device noise; background noise; constant voltage stress; current fluctuation; current step trigger; data filtering algorithm; gate oxide; large-area nMOS capacitor; soft breakdown; Background noise; Breakdown voltage; Capacitors; Carbon capture and storage; Dielectric breakdown; Electric breakdown; MOS devices; Probability; Stress; Testing;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/7298.974830
Filename :
974830
Link To Document :
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