DocumentCode :
1558641
Title :
Metres to nanometres: measurements in clean and dirty environments
Author :
Pitt, G.D.
Volume :
10
Issue :
6
fYear :
2001
fDate :
12/1/2001 12:00:00 AM
Firstpage :
225
Lastpage :
236
Abstract :
Dimensional and materials analytical measurement techniques can now be used to measure parameters down to the subnanometre level. These techniques are now being used in the real manufacturing world for the production of very large components, e.g. aircraft frames, even though the measurements may be carried out under variable conditions (e.g. changes in temperature and pressure). The combination of advanced high-resolution dimension measurements with novel computation techniques is sufficient for real-time measurement and control of machining operations and the surface quality of materials. This article describes a range of techniques, and gives examples showing measurements in difficult environments. Such developments are already showing economic benefits and are likely to be increasingly used in the manufacture and control of larger aerospace machines, as well as for small nanostructures in semiconductor, biomedical and forensic applications
Keywords :
interferometers; materials properties; probes; spatial variables measurement; spectroscopy; aerospace machines; aircraft frames; biomedical applications; clean environments; dimensional analytical measurement techniques; dirty environments; economic benefits; forensic applications; high-resolution dimension measurements; interferometers; linear encoders; machining operations control; materials analytical measurement techniques; mechanical probes; real-time measurement; semiconductor applications; spectroscopy; subnanometre level; very large components production;
fLanguage :
English
Journal_Title :
Engineering Science and Education Journal
Publisher :
iet
ISSN :
0963-7346
Type :
jour
DOI :
10.1049/esej:20010603
Filename :
975695
Link To Document :
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