DocumentCode :
1559183
Title :
Effect of component interactions on the removal of organic impurities in ultrapure water systems
Author :
Governal, Robert A. ; Bonner, Alison ; Shadman, Farhang
Author_Institution :
Dept. of Chem. Eng., Arizona Univ., Tucson, AZ, USA
Volume :
4
Issue :
4
fYear :
1991
fDate :
11/1/1991 12:00:00 AM
Firstpage :
298
Lastpage :
303
Abstract :
The interaction among the components of the ultrapure water systems in semiconductor plants is explored. Two important examples of these interactions are investigated: interactions of ultraviolet (UV) radiation units with membrane filters and interactions of UV with ion-exchange units. Both experimental and theoretical techniques are developed to study these interactions. The results indicate that the sequencing of UV and filter units affect the efficiency of total oxidizable carbon (TOC) removal. In particular, the efficiency is higher when the filter is before UV. Interaction between UV and ion exchange is desirable for the removal of recalcitrant, low-molecular-weight organic compounds such as ethanol, but undesirable for the removal of high-molecular-weight charged compounds such as bacterial lipopolysaccharides, alginic acids, humic acids, methionine, and glycine
Keywords :
filtration; integrated circuit manufacture; ion exchange; semiconductor device manufacture; water; UV radiation units; component interactions; ion-exchange units; membrane filters; organic impurities removal; semiconductor plants; ultrapure water systems; Amino acids; Biomembranes; Contamination; Filters; Organic compounds; Oxidation; Polymers; Purification; Semiconductor impurities; Water pollution;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.97813
Filename :
97813
Link To Document :
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