Title :
Design and fabrication of SiO2/Si3N4 integrated-optics waveguides on silicon substrates
Author :
Bulla, Douglas Anderson Pereira ; Borges, Ben-Hur Viana ; Romero, Murilo Araujo ; Morimoto, Nilton Itiro ; Neto, Luiz Gonçalves
Author_Institution :
Escola Politecnica, Sao Paulo Univ., Brazil
fDate :
1/1/2002 12:00:00 AM
Abstract :
In this paper, the design and fabrication of silicon-based optical waveguides are revisited. The goal is to develop a novel design and deposition process to minimize leakage losses. Interface roughness and Si3N4 stoichiometry are examined. The optical loss is measured and contributions from scattering and absorption are determined
Keywords :
chemical vapour deposition; elemental semiconductors; integrated optics; interface roughness; optical fabrication; optical losses; optical waveguides; silicon; silicon compounds; substrates; LPCVD; Si; Si substrates; Si-based optical waveguides; Si3N4 stoichiometry; SiO2-Si3N4; SiO2/Si3N4 integrated-optics waveguides; TEOS PECVD; absorption; chemical vapor deposition; deposition process; interface roughness; leakage losses; low-pressure CVD; optical loss; plasma-enhanced CVD; scattering; waveguide fabrication; Electromagnetic waveguides; Optical device fabrication; Optical films; Optical losses; Optical refraction; Optical scattering; Optical variables control; Optical waveguides; Silicon; Substrates;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
