DocumentCode :
1560874
Title :
Test structure design for measuring electron and hole mobilities at very high injection levels
Author :
Licciardo, Gian Domenico
Author_Institution :
Dept. of Inf. & Electr. Eng., Salerno Univ., Fisciano, Italy
fYear :
2006
Firstpage :
181
Lastpage :
186
Abstract :
In this paper is presented a new test structure designed to overcome the limitations of an existing measurement method of the carrier-carrier scattering mobility. The proposed test device allows very accurate control of carrier concentrations without limitations on the test structure geometries. Comparisons of simulations with a well known analytical mobility model show the good accuracy of the proposed test structure in measuring electron and hole mobilities till to very high injection levels. First experimental results of the technique are presented.
Keywords :
electron mobility; hole mobility; semiconductor device models; analytical mobility model; carrier concentrations; carrier-carrier scattering mobility; electron mobility measurement; hole mobility measurement; test structure design; very high injection levels; Analytical models; Charge carrier processes; Circuit testing; Electron mobility; Epitaxial layers; Fabrication; P-i-n diodes; Scattering; Substrates; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 2006. ICMTS 2006. IEEE International Conference on
Print_ISBN :
1-4244-0167-4
Type :
conf
DOI :
10.1109/ICMTS.2006.1614300
Filename :
1614300
Link To Document :
بازگشت