Title :
13th IEEE International Conference on Advanced Thermal Processing of Semiconductors
Abstract :
The following topics were dealt with: CMOS; gate dielectrics; high-k films; plasma doping; rapid thermal processing; ultra-shallow junctions; semiconductor materials; laser materials processing; diodes; oxidation; annealing; thermal processing equipment; pyrometry; radiation thermometer; vacuum photothermal processing; heat transfer; and microstructure
Keywords :
CMOS integrated circuits; annealing; crystal microstructure; heat transfer; high-k dielectric thin films; laser materials processing; oxidation; photothermal effects; plasma materials processing; pyrometers; rapid thermal processing; semiconductor diodes; semiconductor doping; semiconductor junctions; semiconductor materials; thermometers; CMOS; annealing; diodes; gate dielectrics; heat transfer; high-k films; laser materials processing; microstructure; oxidation; plasma doping; pyrometry; radiation thermometer; rapid thermal processing; semiconductor materials; thermal processing equipment; ultra-shallow junctions; vacuum photothermal processing; Annealing; CMOS integrated circuits; Laser materials-processing applications; Oxidation; Photothermal effects; Rapid thermal processing; Semiconductor device doping; Semiconductor diodes; Semiconductor junctions; Semiconductor materials; Temperature measurement;
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2005. RTP 2005. 13th IEEE International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-9223-X
DOI :
10.1109/RTP.2005.1614324
