Title :
Light trapping properties of evaporated poly-silicon films on AIT-textured glass substrates
Author :
Chuansuwanich, N. ; Campbell, P. ; Widenborg, P.I. ; Straub, A. ; Aberle, A.G.
Author_Institution :
Centre of Excellence for Adv. Silicon Photovoltaics & Photonics, New South Wales Univ., Sydney, NSW, Australia
Abstract :
This paper explores the optical properties of e-beam evaporated polycrystalline silicon films deposited on a variety of glass surface morphologies produced by the aluminium-induced texturing (AIT) process. We find that very small features laterally one micron or smaller most effectively promote light trapping in films 1-3 μm thick. Light trapping, assessed from reflectance and transmittance measurements, is almost random when the HF concentration required in an etch solution of the AIT process is minimised.
Keywords :
electron beam deposition; elemental semiconductors; etching; evaporation; optical films; radiation pressure; reflectivity; semiconductor growth; semiconductor thin films; silicon; surface morphology; 1 to 3 mum; AIT-textured glass substrates; HF concentration; Si; aluminium-induced texturing process; e-beam evaporated polycrystalline silicon films; etch solution; glass surface morphologies; light trapping; reflectance; transmittance; Annealing; Etching; Glass; Hafnium; Optical films; Semiconductor films; Silicon; Substrates; Surface morphology; Surface texture;
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
Print_ISBN :
0-7803-8707-4
DOI :
10.1109/PVSC.2005.1488344
