Title :
Investigation of high-efficiency screen-printed textured Si solar cells with high sheet-resistance emitters
Author :
Hilali, Mohamed M. ; Nakayashiki, Kenta ; Ebong, Abasifreke ; Rohatgi, Ajeet
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
In this study it is found that the efficiency enhancement (Δη) resulting from the use of a 100 Ω/sq emitter instead of a conventional 45 Ω/sq emitter is substantially enhanced further by surface texturing. This enhancement is greater for textured cells by at least ∼0.4% absolute over the enhancement for planar cells, and is mainly due to the greater difference in the front-surface recombination velocity (FSRV) between the high-and low-sheet-resistance emitter textured cells. A FSRV of 60,000 cm/s resulted in a reasonably good Voc of ∼642 mV for the 100 Ω/sq emitter textured cell. Our investigation of the Ag-Si contact interface shows a more regular distribution of Ag crystallite precipitation for the textured emitter (mainly at the peaks of the texture pyramids). The high contact-quality resulted in a series resistance of 0.79 Ω-cm, a junction leakage current of 18.5 nA/cm2 yielding a FF of 0.784. This resulted in a record high-efficiency 4 cm2 screen-printed cell of 18.8% (confirmed by NREL) on textured 0.6 Ω-cm FZ, with single-layer antireflection coating.
Keywords :
antireflection coatings; crystallites; electrical resistivity; elemental semiconductors; leakage currents; precipitation; silicon; silver; solar cells; surface recombination; surface texture; 18.8 percent; Ag-Si; antireflection coating; contact interface; crystallite; front-surface recombination velocity; high-efficiency screen-printed textured solar cells; junction leakage current; precipitation; series resistance; sheet-resistance emitters; surface texturing; Computer science education; Conductivity; Costs; Electric resistance; Photovoltaic cells; Reflectivity; Strontium; Surface texture; Surface waves; Throughput;
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
Print_ISBN :
0-7803-8707-4
DOI :
10.1109/PVSC.2005.1488350