DocumentCode :
1561621
Title :
Benefit of dual layer silicon nitride anti-reflection coating
Author :
Kumar, Bikash ; Pandian, T. Baskara ; Sreekiran, E. ; Narayanan, Srinivasamohan
Author_Institution :
Tata BP Solar, Bangalore, India
fYear :
2005
Firstpage :
1205
Lastpage :
1208
Abstract :
Majority of commercial silicon solar cell technology around the world is based on screen print technology with or without a single or combined layer of titanium dioxide, silicon dioxide or recently PECVD silicon nitride. Most of the reported work on dual layer anti-reflection coating is based on two different materials. Less work has been done on dual layer silicon nitride for this purpose. In this work, a simple approach is presented to utilize dual layer silicon nitride. An improvement in weighted average reflectance has been achieved compared to single layer silicon nitride layer by this approach.
Keywords :
antireflection coatings; elemental semiconductors; optical losses; plasma CVD; reflectivity; refractive index; silicon; silicon compounds; solar cells; PECVD; Si; SiN; commercial silicon solar cell technology; dual layer silicon nitride anti-reflection coating; reflectance; screen print technology; silicon dioxide; titanium dioxide; Coatings; Equations; Etching; Optical polarization; Optical reflection; Optical refraction; Photovoltaic cells; Reflectivity; Refractive index; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
ISSN :
0160-8371
Print_ISBN :
0-7803-8707-4
Type :
conf
DOI :
10.1109/PVSC.2005.1488355
Filename :
1488355
Link To Document :
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