DocumentCode :
1562196
Title :
Simulation on 1-MeV electron-beam irradiated amorphous silicon solar cells with varying thickness
Author :
Klaver, A. ; Metselaar, J.W. ; Zeman, M. ; van Swaaij, R.A.C.M.M.
Author_Institution :
DIMES-ECTM, Delft Univ. of Technol., Netherlands
fYear :
2005
Firstpage :
1440
Lastpage :
1443
Abstract :
To use solar cells for space applications it is important to be able to predict the end-of-life (EOL) performance of the cell. To create a model to predict this EOL performance, quantitative information about degradation mechanisms is needed. In this paper we show quantum efficiency (QE) simulations and experimental results for high-energy electron beam irradiated solar cells. To study the depth dependence of the defect creation, solar cells with a varying i-layer thickness were irradiated. The changes in the QE are attributed to changes in the defect density of states of the material, which is linked to recombination processes in the material. Using this approach we are able to obtain a good match between the experimental and simulated QE results.
Keywords :
amorphous semiconductors; dangling bonds; defect states; electron beam effects; elemental semiconductors; silicon; solar cells; Si; defect density; electron-beam irradiated amorphous silicon solar cells; end-of-life performance; i-layer thickness; quantum efficiency; recombination processes; Amorphous silicon; Computer simulation; Degradation; Electron beams; Photovoltaic cells; Predictive models; Radiative recombination; Space missions; Space technology; Spontaneous emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
ISSN :
0160-8371
Print_ISBN :
0-7803-8707-4
Type :
conf
DOI :
10.1109/PVSC.2005.1488412
Filename :
1488412
Link To Document :
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