• DocumentCode
    156339
  • Title

    Effect of linear dimensions of the drain-source 2D-channel of AlGaN/GaN hemt on its static current-voltage characteristics (lateral size effect)

  • Author

    Torkhov, N.A. ; Bozhkov, V.G.

  • Author_Institution
    Sci.- Res. Inst. of Semicond., Tomsk, Russia
  • fYear
    2014
  • fDate
    7-13 Sept. 2014
  • Firstpage
    669
  • Lastpage
    670
  • Abstract
    It is shown that in the local approximation, the fractality of electrical properties of the 2D-channel has strong influence on the behavior of static CVC of the drain-source channel of AlGaN/GaN HEMT. An increase of the linear resistance ρ(l,d) with decreasing length l and width d of the channel down to the values less than the limit of the local approximation L leads to a slower growth of the drain current Id and a more rapid increase of Rd. Only in the global approximation, when l and d > L, the parameters Id and Rd have the well-known classical dependences on the length and width of the channel for the specific resistance Rsp = R-.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; AlGaN-GaN; HEMT; drain-source 2D-channel; high electron mobility transistors; lateral size effect; linear resistance; Aluminum gallium nitride; Gallium nitride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-966-335-412-5
  • Type

    conf

  • DOI
    10.1109/CRMICO.2014.6959579
  • Filename
    6959579