DocumentCode :
156348
Title :
Anisotropy and frequency dependence determination of relative dielectric constant for sapphire and silicon carbide substrates
Author :
Torkhov, N.A. ; Salnikov, A.S. ; Minin, O.N. ; Kupreychik, A.F. ; Babak, L.I. ; Bozhkov, V.G.
Author_Institution :
Sci.- Res. Inst. of Semicond. Devices, Tomsk, Russia
fYear :
2014
fDate :
7-13 Sept. 2014
Firstpage :
684
Lastpage :
685
Abstract :
Study results of frequency properties of sapphire and 4H-SiC{0001} silicon carbide substrate show availability of anisotropy and dispersion of effective dielectric constant ε(f). In both cases a value of ε(f) decreases with frequency f increasing. For a sapphire substrate the dispersion (ε(f=3.3 GHz)=9.32 and ε(f=37.6GHz)=8.62) is 7.5 percent, anisotropy is lesser than 0.5 percent. For 4H-SiC substrates a maximum value of dispersion (ε(f=3.47 GHz)=8.34 and ε(f=46.63 GHz)=7.77) is 6.8 percent, and anisotropy is 2.8 percent.
Keywords :
permittivity; sapphire; silicon compounds; wide band gap semiconductors; SiC; anisotropy; frequency dependence determination; relative dielectric constant; sapphire substrates; silicon carbide substrates; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-966-335-412-5
Type :
conf
DOI :
10.1109/CRMICO.2014.6959584
Filename :
6959584
Link To Document :
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