• DocumentCode
    156399
  • Title

    Investigation of forming nanoclusters of germanium and silicon ??? germanium solid in LPCVD process

  • Author

    Kovalevsky, A.A. ; Strogova, A.S. ; Strogova, N.S. ; Borisevich, V.M.

  • Author_Institution
    Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
  • fYear
    2014
  • fDate
    7-13 Sept. 2014
  • Firstpage
    734
  • Lastpage
    735
  • Abstract
    The process of self-organization and evolution of the stable perfectly-ordered nanoclusters of Si, Ge and SiGe solid solution in thin-film deposition process of the germanium-alloyed silicon for the new generation electronic devices is studied.
  • Keywords
    electroforming; elemental semiconductors; laser deposition; nanostructured materials; plasma CVD; LPCVD process; electronic devices; germanium solid solution; nanocluster forming; silicon solid solution; silicon-germanium solid solution; stable perfectly-ordered nanocluster evolution; stable perfectly-ordered nanocluster self-organization process; thin-film deposition process; Germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-966-335-412-5
  • Type

    conf

  • DOI
    10.1109/CRMICO.2014.6959608
  • Filename
    6959608
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=156399