Title :
Simulation on A Novel Ga-doped Phase Change Memory for Next Generation Embedded Non-Volatile Memory Application
Author :
Cheng, Xiu-Lan ; Yin, Wen ; Feng, Zhi-Gang ; Liang, Tian-Yi
Author_Institution :
Sch. of Microelectron., Shanghai Jiaotong Univ., Shanghai
Abstract :
Phase change memory (PCM) becomes very hot in Non volatile memory (NVM) with 65 nm below technologies due to its special storage mode. However, several bottlenecks like power, thermal stability and cycling ability limit the development of PCM. Thus, in this paper, a novel phase change memory based on alloy Ga3Sb8Te1 is designed, then FEA transient thermal, crystalline kinetics analysis and SPICE macro model of embedded PCM based on this material are established. The results of FEA transient thermal simulation and crystalline kinetics analysis show that comparing with conventional GeSbTe-base material the new phase change alloy Ga3Sb8Te1 has lower reset power, higher thermal stability and cycling ability as well as faster set frequency.
Keywords :
SPICE; antimony alloys; finite element analysis; gallium alloys; phase change materials; random-access storage; tellurium alloys; thermal stability; FEA transient thermal simulation; SPICE macro model; crystalline kinetics analysis; cycling ability; next generation embedded non-volatile memory application; phase change alloy; phase change memory; storage mode; thermal stability; Crystallization; Gallium alloys; Kinetic theory; Nonvolatile memory; Phase change materials; Phase change memory; Tellurium; Thermal stability; Tin alloys; Transient analysis; SPICE macro model; finite element analysis; non-volatile memory; phase change memory;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2008.4529004